Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N - Abadias, G.; Koutsokeras, L.E.; Dub, S.N.; Tolmachova, G.N.; Debelle, A.; Sauvage, T.; Villechaise, P. (Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2010)
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