<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Abadias, G.</style></author><author><style face="normal" font="default" size="100%">Koutsokeras, L.E.</style></author><author><style face="normal" font="default" size="100%">Dub, S.N.</style></author><author><style face="normal" font="default" size="100%">Tolmachova, G.N.</style></author><author><style face="normal" font="default" size="100%">Debelle, A.</style></author><author><style face="normal" font="default" size="100%">Sauvage, T.</style></author><author><style face="normal" font="default" size="100%">Villechaise, P.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2010</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-77954196319&amp;doi=10.1116%2f1.3426296&amp;partnerID=40&amp;md5=9f82e5582d9a7e05f52c84c42955bc44</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">4</style></number><volume><style face="normal" font="default" size="100%">28</style></volume><pages><style face="normal" font="default" size="100%">541-551</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><notes><style face="normal" font="default" size="100%">cited By 77</style></notes></record></records></xml>