@article {Manousou2021,
	title = {VO2 thin films fabricated by reduction of thermal evaporated V2O5 under N2 flow},
	journal = {Materials Letters},
	volume = {299},
	year = {2021},
	note = {cited By 1},
	abstract = {VO2 thin films were fabricated by thermal evaporation of V2O5 on quartz and glass and subsequent reduction in nitrogen (N2). This Physical Vapor Deposition (PVD) method resulted in high-quality single phase VO2(M1) films with sharp changes in resistance (3{\textendash}4 orders of magnitude) and transmittance (40{\textendash}45\%) at λ= 1550 nm accompanied by narrow hysteresis loops (~ 4{\textendash}5 K) around the Semiconductor-to-Metal Transition (SMT). {\textcopyright} 2021 Elsevier B.V.},
	doi = {10.1016/j.matlet.2021.130086},
	url = {https://www.scopus.com/inward/record.uri?eid=2-s2.0-85107129105\&doi=10.1016\%2fj.matlet.2021.130086\&partnerID=40\&md5=880908201af1a808894dfe3d78a74ade},
	author = {Manousou, D.K. and Gardelis, S. and Calamiotou, M. and Syskakis, E.}
}
