Simulated tests of large samples indicate a logarithmic extreme value distribution in electromigration induced failures of thin film interconnects
Citation:
Loupis M, Avaritsiotis J. Simulated tests of large samples indicate a logarithmic extreme value distribution in electromigration induced failures of thin film interconnects. In: Conference Proceedings; 1995. pp. 353 - 358.
Department of Agricultural Development, Agri-Food and Natural Resources Management National and Kapodistrian University of Athens Evripou Campus, Office AΓ08-09 Tel. +30 22280 21906, Mob. +30 697 715 4332 Psachna, ZipCode 344 00 mloupis@uoa.gr
