The applicability of logarithmic extreme value distributions in electomigration induced failures of AlCu thin-film interconnects
Citation:
Loupis MI, Avaritsiotis JN. The applicability of logarithmic extreme value distributions in electomigration induced failures of AlCu thin-film interconnects. 1995;35(3):611 - 617.
Department of Agricultural Development, Agri-Food and Natural Resources Management National and Kapodistrian University of Athens Evripou Campus, Office AΓ08-09 Tel. +30 22280 21906, Mob. +30 697 715 4332 Psachna, ZipCode 344 00 mloupis@uoa.gr
