Comparative study of statistical distributions in electromigration-induced failures of Al/Cu thin-film interconnects

Citation:

Loupis MI, Avaritsiotis JN, Tziallas GD. Comparative study of statistical distributions in electromigration-induced failures of Al/Cu thin-film interconnects. 1994;16(2):119 - 126.

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Department of Agricultural Development, Agri-Food and Natural Resources Management
National and Kapodistrian University of Athens
Evripou Campus, Office AΓ08-09
Tel. +30 22280 21906, Mob. +30 697 715 4332
Psachna, ZipCode 344 00
mloupis@uoa.gr

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Michael Loupis

Associate Professor, Agricultural Development, Agrofood and Management of Natural Resources

Comparative study of statistical distributions in electromigration-induced failures of Al/Cu thin-film interconnects

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