Simulated tests of large samples indicate a logarithmic extreme value distribution in electromigration induced failures of thin film interconnects
Citation:
Loupis M, Avaritsiotis J. Simulated tests of large samples indicate a logarithmic extreme value distribution in electromigration induced failures of thin film interconnects. In: RELECTRONIC 1995 Budapest. Conference Proceedings; 1995. pp. 353–358.
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