Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N

Citation:

Abadias G, Koutsokeras LE, Dub SN, Tolmachova GN, Debelle A, Sauvage T, Villechaise P. Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films [Internet]. 2010;28:541-551.

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