Citation:
Abadias G, Koutsokeras LE, Dub SN, Tolmachova GN, Debelle A, Sauvage T, Villechaise P. Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films [Internet]. 2010;28:541-551.