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VO2 thin films fabricated by reduction of thermal evaporated V2O5 under N2 flow

Citation:

Manousou DK, Gardelis S, Calamiotou M, Syskakis E. VO2 thin films fabricated by reduction of thermal evaporated V2O5 under N2 flow. Materials Letters [Internet]. 2021;299.

Abstract:

VO2 thin films were fabricated by thermal evaporation of V2O5 on quartz and glass and subsequent reduction in nitrogen (N2). This Physical Vapor Deposition (PVD) method resulted in high-quality single phase VO2(M1) films with sharp changes in resistance (3–4 orders of magnitude) and transmittance (40–45%) at λ= 1550 nm accompanied by narrow hysteresis loops (  4–5 K) around the Semiconductor-to-Metal Transition (SMT). © 2021 Elsevier B.V.

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